Formation of a TiO2 Micronetwork on a UV-Absorbing SiO2-Based Glass Surface by Excimer Laser Irradiation-Reference-Cited by-同舟云学术

Formation of a TiO2 Micronetwork on a UV-Absorbing SiO2-Based Glass Surface by Excimer Laser Irradiation

Published:2005-12-01 Issue:26 Volume:17 Page:6651-6655
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Narazaki Aiko¹,Kawaguchi Yoshizo¹,Niino Hiroyuki¹,Shojiya Masanori¹,Koyo Hirotaka¹,Tsunetomo Keiji¹

Affiliation:

1. Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5, Higashi 1-1-1, Tsukuba, Ibaraki 305-8565, Japan, and Technical Research Laboratory, Kansai Research Center, Nippon Sheet Glass Co., Ltd., 1, Kaidoshita, Konoike, Itami, Hyogo 664-8520, Japan

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm0518372

Reference18 articles.

1. Lithography-free high aspect ratio submicron quartz columns by reactive ion etching

2. Formation of plasma induced surface damage in silica glass etching for optical waveguides

3. A Microfluidic Device for Conducting Gas-Liquid-Solid Hydrogenation Reactions

4. Ultrahigh-speed etching of SiO2 with ultrahigh selectivity over Si in microwave-excited non equilibrium atmospheric pressure plasma

5. Surface micromachined glass and polysilicon microchannels using MUMPs for BioMEMS applications

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