Lithography-free high aspect ratio submicron quartz columns by reactive ion etching
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1647280
Reference6 articles.
1. Multiple-layer blank structure for phase-shifting mask fabrication
2. Qualification of supermirrors for ring-laser-gyros based on surface roughness and scatter measurements
3. Reactive ion etching of quartz and Pyrex for microelectronic applications
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5. Plasma–surface interaction at sharp edges and corners during ion-assisted physical vapor deposition. Part I: Edge-related effects and their influence on coating morphology and composition
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1. Subwavelength Hollow-Nanopillared Glass with Gradient Refractive Index for Ultralow Diffuse Reflectance and Antifogging;ACS Applied Materials & Interfaces;2020-01-02
2. Large-Scale, Lithography-Free Production of Transparent Nanostructured Surface for Dual-Functional Electrochemical and SERS Sensing;ACS Sensors;2017-12-06
3. Lithography-Free Fabrication of Silica Nanocylinders with Suspended Gold Nanorings for LSPR-Based Sensing;Small;2016-10-06
4. Selective Plasma Etching of Polymeric Substrates for Advanced Applications;Nanomaterials;2016-06-07
5. Extreme wettability of nanostructured glass fabricated by non-lithographic, anisotropic etching;Scientific Reports;2015-03-20
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