Plasma–surface interaction at sharp edges and corners during ion-assisted physical vapor deposition. Part I: Edge-related effects and their influence on coating morphology and composition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1597755
Reference14 articles.
1. Influence of substrate shape on TiN films prepared by reactive sputtering
2. Deposition behaviours of CrN films on the edge area by cathodic arc plasma deposition process
3. Study of hard PVD coatings on strongly curved surfaces
4. PVD coating of 3D parts studied with model samples
5. Electron microscopy studies of hard coatings deposited on sharp edges by combined cathodic arc/unbalanced magnetron PVD
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