Formation of plasma induced surface damage in silica glass etching for optical waveguides
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1739525
Reference17 articles.
1. Deep, vertical etching of flame hydrolysis deposited hi-silica glass films for optoelectronic and bioelectronic applications
2. Reactive ion etching of silica structures for integrated optics applications
3. Inductively coupled plasma etching of Ge-doped boron-phosphosilicate glass for planar lightwave circuit devices
4. Substrate bias effects in high‐aspect‐ratio SiO2 contact etching using an inductively coupled plasma reactor
5. Fluorocarbon high‐density plasmas. II. Silicon dioxide and silicon etching using CF4 and CHF3
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