Molecular Dynamics Simulation of Silicon Dioxide Etching by Hydrogen Fluoride Using the Reactive Force Field-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Molecular Dynamics Simulation of Silicon Dioxide Etching by Hydrogen Fluoride Using the Reactive Force Field

Published:2021-06-08 Issue:24 Volume:6 Page:16009-16015
ISSN:2470-1343
Container-title:ACS Omega
language:en
Short-container-title:ACS Omega

Author:

Kim Dong Hyun¹^ORCID,Kwak Seung Jae¹,Jeong Jae Hun¹,Yoo Suyoung²,Nam Sang Ki²,Kim YongJoo³,Lee Won Bo¹^ORCID

Affiliation:

1. School of Chemical and Biological Engineering, Institute of Chemical Processes, Seoul National University, Seoul 08826, Republic of Korea

2. Samsung Electronics, 1-1 Samsungjeonja-ro, Hwaseong, Gyeonggi 18448, Republic of Korea

3. School of Advanced Materials Engineering, Kookmin University, Seoul 02707, Republic of Korea

Funder

Samsung

National Research Foundation of Korea

Publisher

American Chemical Society (ACS)

Subject

General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acsomega.1c01824

Reference37 articles.

1. Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. II. Surface reaction mechanism

2. Fluorine–Silicon Surface Reactions during Cryogenic and Near Room Temperature Etching

3. Chemical sputtering of fluorinated silicon

4. Gaseous products from the reaction of XeF2with silicon

5. Surface science aspects of etching reactions

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development of a ReaxFF Reactive Force Field for Pt/Cl Systems with Application to Platinum Metal Etching with Chlorine and Hydrogen Chloride Gases;The Journal of Physical Chemistry A;2024-09-10

2. Atomistic Simulation of HF Etching Process of Amorphous Si₃N₄ Using Machine Learning Potential;ACS Applied Materials & Interfaces;2024-08-28

3. Atmospheric Gas-Phase Catalyst Etching of SiO₂ for Deep Microfabrication Using HF Gas and Patterned Photoresist;ACS Applied Materials & Interfaces;2024-04-23

4. An examination of the performance of molecular dynamics force fields: Silicon and silicon dioxide reactive ion etching;Journal of Vacuum Science & Technology A;2024-02-12

5. Solvatomorphism with polar protic/aprotic and non-polar solvents in a series of complexes derived from the 5-phenylimidazole/tetrafluoroborate/copper(ii) reaction system;CrystEngComm;2024

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3