Fluorine–Silicon Surface Reactions during Cryogenic and Near Room Temperature Etching
Author:
Affiliation:
1. Research Group PLASMANT, Department of Chemistry, University of Antwerp, Universiteitsplein 1, B-2610 Antwerp, Belgium
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/jp5108872
Reference36 articles.
1. Surface science aspects of etching reactions
2. Mechanism of ion-assisted etching of silicon by fluorine atoms
3. Atomistic simulations of spontaneous etching of silicon by fluorine and chlorine
4. Molecular dynamics simulations of Si–F surface chemistry with improved interatomic potentials
5. Molecular dynamics simulations of silicon-fluorine etching
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