Mesostructured HfO2/Al2O3 Composite Thin Films with Reduced Leakage Current for Ion-Conducting Devices-Reference-Cited by-同舟云学术

Mesostructured HfO2/Al2O3 Composite Thin Films with Reduced Leakage Current for Ion-Conducting Devices

Published:2019-08-30 Issue:12 Volume:4 Page:14680-14687
ISSN:2470-1343
Container-title:ACS Omega
language:en
Short-container-title:ACS Omega

Author:

Zakaria Mohamed Barakat¹²^ORCID,Nagata Takahiro¹,Chikyow Toyohiro¹³

Affiliation:

1. International Center for Materials Nanoarchitectonics (MANA), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan

2. Department of Chemistry, Faculty of Science, Tanta University, Tanta, Gharbeya 31527, Egypt

3. Materials Data & Integrated System (MaDIS), National Institute for Materials Science (NIMS), 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan

Funder

Japan Society for the Promotion of Science

Publisher

American Chemical Society (ACS)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.acs.org/doi/pdf/10.1021/acsomega.9b01095

Reference38 articles.

1. Study on the Formation of Self-Assembled Monolayers on Sol−Gel Processed Hafnium Oxide as Dielectric Layers

2. Low-Energy Path to Dense HfO2 Thin Films with Aqueous Precursor

3. Ambient-Processable High Capacitance Hafnia-Organic Self-Assembled Nanodielectrics

4. Block Copolymer Templating Syntheses of Mesoporous Metal Oxides with Large Ordering Lengths and Semicrystalline Framework

5. Preparation of porous hafnium oxide in the presence of a cationic surfactant

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