High-throughput growth of HfO<sub>2</sub> films using temperature-gradient laser chemical vapor deposition-Reference-Cited by-同舟云学术

High-throughput growth of HfO₂ films using temperature-gradient laser chemical vapor deposition

Published:2022 Issue:24 Volume:12 Page:15555-15563
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Tu Rong¹²^ORCID,Liu Ziming²,Wang Chongjie²,Lu Pengjian²³,Guo Bingjian⁴⁵,Xu Qingfang²,Li Bao-Wen⁴^ORCID,Zhang Song²^ORCID

Affiliation:

1. Chaozhou Branch of Chemistry and Chemical Engineering Guangdong Laboratory, Chaozhou 521000, People's Republic of China

2. State Key Laboratory of Advanced Technology for Materials and Processing, Wuhan University of Technology, 122 Luoshi Road, Wuhan 430070, People's Republic of China

3. Wuhan Tuocai Technology Co., Ltd., 147 Luoshi Road, Wuhan 430070, People's Republic of China

4. School of Materials Science and Engineering, Wuhan University of Technology, 122 Luoshi Road, Wuhan 430070, People's Republic of China

5. Zhejiang MTCN Technology Co., Ltd., No. 59, Luhui Road, Taihu Street, Zhejiang Province 311103, People's Republic of China

Abstract

In this study, HfO2 films were grown using a highly efficient HT-LCVD process with a large gradient (100 K mm−1) temperature field, achieving four novel microstructures which appeared simultaneously on a high-throughput sample.

Funder

Data Center of Management Science, National Natural Science Foundation of China – Peking University

Higher Education Discipline Innovation Project

International Science and Technology Cooperation Programme

Special Project for Research and Development in Key areas of Guangdong Province

Hubei Technological Innovation Special Fund

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2022/RA/D2RA01573K