New Volatile Tantalum Imido Precursors with Carboxamide Ligands-Reference-Cited by-同舟云学术

New Volatile Tantalum Imido Precursors with Carboxamide Ligands

Published:2021-09-16 Issue:38 Volume:6 Page:24795-24802
ISSN:2470-1343
Container-title:ACS Omega
language:en
Short-container-title:ACS Omega

Author:

Hwang Jeong Min¹,Lee Sung Kwang¹²,Shin Sunyoung¹,Jeong Ji-Seoung¹²,Kim Hae Sun¹²,Ryu Ji Yeon¹^ORCID,Eom Taeyong¹^ORCID,Park Bo Keun¹^ORCID,Kim Chang Gyoun¹,Chung Taek-Mo¹^ORCID

Affiliation:

1. Thin Film Materials Research Center, Korea Research Institute of Chemical Technology, 141 Gajeong-ro, Yuseong-gu, Daejeon 34114, Republic of Korea

2. Department of Chemistry, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do 16419, Republic of Korea

Funder

Korea Research Institute of Chemical Technology

National Research Foundation of Korea

Publisher

American Chemical Society (ACS)

Subject

General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acsomega.1c03659

Reference37 articles.

1. Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films

2. Comparison of the Atomic Layer Deposition of Tantalum Oxide Thin Films Using Ta(NtBu)(NEt2)3, Ta(NtBu)(NEt2)2Cp, and H2O

3. Effects of oxygen content on the optical properties of tantalum oxide films deposited by ion-beam sputtering

4. Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex

5. Antireflecting coating from Ta2O5 and SiO2 multilayer films

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