Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films-Reference-Cited by-同舟云学术

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Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films

Published:2006-12 Issue:4 Volume:515 Page:1674-1682
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Masse J.-P.,Szymanowski H.,Zabeida O.,Amassian A.,Klemberg-Sapieha J.E.,Martinu L.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference36 articles.

1. Highly efficient Cherenkov‐type second harmonic generation in a Ta2O5/KTiOPO4waveguide

2. Chemical Vapor Deposition of Tantalum Oxide from Tetraethoxo(β-diketonato)tantalum(V) Complexes

3. Recent topics of research and development of catalysis by niobium and tantalum oxides

4. Supported Tantalum Oxide and Supported Vanadia-tantala Mixed Oxides: Structural Characterization and Surface Properties

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4. Sol-gel prepared amorphous Ta2O5 thin film for application in high LIDT antireflection coating and UV photodetection;Optical Materials;2023-08

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