Study of reactive electron beam deposited tantalum penta oxide thin films with spectroscopic ellipsometry and atomic force microscopy-Reference-Cited by-同舟云学术

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Study of reactive electron beam deposited tantalum penta oxide thin films with spectroscopic ellipsometry and atomic force microscopy

Published:2023-12 Issue: Volume:18 Page:100480
ISSN:2666-5239
Container-title:Applied Surface Science Advances
language:en
Short-container-title:Applied Surface Science Advances

Author:

Tokas R.B.^ORCID,Jena S.^ORCID,Prathap C.,Thakur S.,Divakar Rao K.,Udupa D.V.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces

Reference53 articles.

1. Experimental and theoretical band alignment of Ta2O5/ZnO stack for heterostructured devices applications;Liu;Physica B,2021

2. Cell adhesion characteristics on tantalum pentoxide gate insulator for cultured-cell-gate field-effect transistor;Satake;Langmuir,2021

3. Electrical and optical properties of tantalum oxide thin films prepared by reactive magnetron sputtering;Wei;J. Alloys Compd.,2011

4. Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films;Masse;Thin Solid Films,2006

5. Comprehensive study of amorphous metal oxide and Ta2O5-based mixed oxide coatings for gravitational-wave detectors;Fazio;Phys. Rev. D,2022

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Exploring the optical and morphological properties of metal oxide thin films produced via reactive electron beam evaporation;Cogent Engineering;2024-04-10

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