First-Principles Analyses and Predictions on the Reactivity of Barrier Layers of Ta and TaN toward Organometallic Precursors for Deposition of Copper Films-Reference-Cited by-同舟云学术

First-Principles Analyses and Predictions on the Reactivity of Barrier Layers of Ta and TaN toward Organometallic Precursors for Deposition of Copper Films

Published:2005-06-29 Issue:16 Volume:21 Page:7608-7614
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Machado Eduardo¹,Kaczmarski Marcin¹,Ordejón Pablo¹,Garg Diwakar¹,Norman John¹,Cheng Hansong¹

Affiliation:

1. Institut de Ciencia de Materials de Barcelona - CSIC, E-08193 Bellaterra, Barcelona, Spain, and Computational Modeling Center and Corporate Science and Technology Center, Air Products and Chemicals, Inc., 7201 Hamilton Boulevard, Allentown, Pennsylvania 18195-501

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la050164z

Reference29 articles.

1. Copper metalorganic chemical vapor deposition reactions of hexafluoroacetylacetonate Cu(I) vinyltrimethylsilane and bis (hexafluoroacetylacetonate) Cu(II) adsorbed on titanium nitride

2. Advanced multilayer metallization schemes with copper as interconnection metal

3. Interdiffusions in Cu/reactive‐ion‐sputtered TiN, Cu/chemical‐vapor‐deposited TiN, Cu/TaN, and TaN/Cu/TaN thin‐film structures: Low temperature diffusion analyses

Cited by 31 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Molecular Layering of Oxide Nanostructures on the Surface of Metal Matrices;Russian Microelectronics;2022-04

2. Atomic layer deposition of metals: Precursors and film growth;Applied Physics Reviews;2019-12

3. Thermal Chemistry of Metal Organic Compounds Adsorbed on Oxide Surfaces;Organometallics;2019-11-25

4. Chemical Processes Involved in Atomic Layer Deposition of Gallium Sulfide: Insights from Theory;The Journal of Physical Chemistry C;2017-03-15

5. Classification of processes for the atomic layer deposition of metals based on mechanistic information from density functional theory calculations;The Journal of Chemical Physics;2017-02-07