Author:
Murarka S.P.,Gutmann R.J.,Kaloyeros A.E.,Lanford W.A.
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference46 articles.
1. Tungsten and Other Advanced Metals for VLSO Applications in 1990;Murarka,1991
2. Reactive Ion Etching of Copper Films
3. Reactive ion etching of copper in SiCl4‐based plasmas
4. Proc. Conf. on Advanced Metallization for VLSI Applications;Howard,1993
Cited by
244 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献