Crystallinity Study of Cu Thin Film Deposited by Indigenously Developed DC Magnetron Sputtering Setup

Abstract

AbstractThe copper thin films have a huge application in the field of material science research and they also act as a catalytic substrate which helps to deposit various carbon‐based polymers that can be used for sensors. There are several thin film development techniques available in the industries out of which magnetron sputtering technique shows some remarkable properties essential for depositing metal thin film efficiently. The main objective of this work is to develop copper thin films utilizing an indigenously designed and developed DC magnetron sputtering system. The X‐ray diffraction (XRD) pattern of the developed thin films display prominent peaks of copper (111) plane along with cuprous oxide (110), (111), and (220), respectively. This work also aims to study in detail the crystallinity of the deposited copper thin films by analyzing the XRD results for optimization.