In Situ Transport Measurements Reveal Source of Mobility Enhancement of MoS2 and MoTe2 during Dielectric Deposition-Reference-Cited by-同舟云学术

In Situ Transport Measurements Reveal Source of Mobility Enhancement of MoS2 and MoTe2 during Dielectric Deposition

Author:

Shang Ju Ying¹,Moody Michael J.¹,Chen Jiazhen²^ORCID,Krylyuk Sergiy³,Davydov Albert V.³^ORCID,Marks Tobin J.¹²^ORCID,Lauhon Lincoln J.¹

Affiliation:

1. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States

2. Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States

3. Materials Science and Engineering Division, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States

Funder

National Institute of Standards and Technology

National Science Foundation

Division of Materials Research

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Electrochemistry,Electronic, Optical and Magnetic Materials

Link

Reference45 articles.

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