Influence of Sapphire Substrate Orientation on the van der Waals Epitaxy of III-Nitrides on 2D Hexagonal Boron Nitride: Implication for Optoelectronic Devices

Author:

Vuong Phuong1ORCID,Sundaram Suresh12,Ottapilakkal Vishnu1,Patriarche Gilles3,Largeau Ludovic3,Srivastava Ashutosh12,Mballo Adama1ORCID,Moudakir Tarik4,Gautier Simon4,Voss Paul L.12,Salvestrini Jean-Paul12ORCID,Ougazzaden Abdallah12ORCID

Affiliation:

1. Georgia Tech Lorraine, IRL 2958-CNRS, 57070 Metz, France

2. School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States

3. Centre de Nanosciences et de Nanotechnologies, C2N─Site de Marcoussis, Université Paris-Saclay, Route de Nozay, F-91460 Marcoussis, France

4. Institut Lafayette, 2 rue Marconi, 57070 Metz, France

Funder

French National Research Agency

French Renatech network and the ANR ?Investissement d?Avenir? program

Grand EST Region

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

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