Formation of SiP2 Nanocrystals Embedded in SiO2 from Phosphorus-Rich SiO1.5 Thin Films
Author:
Affiliation:
1. IJL, CNRS—Université de Lorraine, F-54000 Nancy, France
2. LCPME, Université de Lorraine—UMR CNRS 7564, 405 rue de Vandoeuvre, 54600 Villers-lès-Nancy, France
Funder
Universit? de Lorraine
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.9b11416
Reference45 articles.
1. Self-Purification in Semiconductor Nanocrystals
2. Phosphorus doping of ultra-small silicon nanocrystals
3. Electronic properties of phosphorus doped silicon nanocrystals embedded in SiO2
4. Efficient n-type doping of Si nanocrystals embedded in SiO2 by ion beam synthesis
5. Incorporation of dopant impurities into a silicon oxynitride matrix containing silicon nanocrystals
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