Influence of phosphorus on the growth and the photoluminescence properties of Si-NCs formed in P-doped SiO/SiO2 multilayers

Author:

Trad Fatme1,Giba Alaa E.12,Devaux Xavier1ORCID,Stoffel Mathieu1ORCID,Zhigunov Denis3,Bouché Alexandre1,Geiskopf Sébastien1,Demoulin Rémi4,Pareige Philippe4,Talbot Etienne4,Vergnat Michel1ORCID,Rinnert Hervé1ORCID

Affiliation:

1. Université de Lorraine, CNRS, Institut Jean Lamour, F-54000 Nancy, France

2. National Institute of Laser Enhanced Sciences, Cairo University, Giza 12613, Egypt

3. Skolkovo Institute of Science and Technology, Bolshoy Boulevard 30, bld. 1, 121205 Moscow, Russia

4. Normandie Univ., UNIROUEN, INSA Rouen, CNRS, Groupe de Physique des Matériaux, 76000 Rouen, France

Abstract

Localization at the nanoscale and influence of P atoms on optically active Si-NCs embedded in a SiO2 matrix.

Funder

Agence Nationale de la Recherche

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

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1. Doped silicon nanoparticles. A review;Доклады Российской академии наук. Химия, науки о материалах;2024-07-19

2. Doped Silicon Nanoparticles. A Review;Doklady Chemistry;2024-01

3. Isolation of cubic Si3P4 in the form of nanocrystals;Beilstein Journal of Nanotechnology;2023-09-26

4. Heavily Doped Si Nanocrystals Formed in P-(SiO/SiO2) Multilayers: A Promising Route for Si-Based Infrared Plasmonics;ACS Applied Nano Materials;2023-02-22

5. Atomic-scale study on the dopant distribution in phosphorus and boron-doped Si nanocrystals/SiO2 multilayers;Applied Surface Science;2023-01

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