Heavily Doped Si Nanocrystals Formed in P-(SiO/SiO<sub>2</sub>) Multilayers: A Promising Route for Si-Based Infrared Plasmonics-Reference-Cited by-同舟云学术

Heavily Doped Si Nanocrystals Formed in P-(SiO/SiO₂) Multilayers: A Promising Route for Si-Based Infrared Plasmonics

Published:2023-02-22 Issue:5 Volume:6 Page:3312-3320
ISSN:2574-0970
Container-title:ACS Applied Nano Materials
language:en
Short-container-title:ACS Appl. Nano Mater.

Author:

Valdenaire Alix¹,Giba Alaa Eldin¹²,Stoffel Mathieu¹^ORCID,Devaux Xavier¹^ORCID,Foussat Loïc³,Poumirol Jean-Marie³^ORCID,Bonafos Caroline³,Guehairia Sonia⁴,Demoulin Rémi⁴,Talbot Etienne⁴^ORCID,Vergnat Michel¹,Rinnert Hervé¹

Affiliation:

1. Institut Jean Lamour, Université de Lorraine, CNRS, F-54000 Nancy, France

2. National Institute of Laser Enhanced Sciences, Cairo University, Giza 12613, Egypt

3. CEMES-CNRS, Université de Toulouse, CNRS, 31055 Toulouse, France

4. Groupe de Physique des Matériaux, Normandie Univ., UNIROUEN, INSA Rouen, CNRS, 76000 Rouen, France

Funder

Agence Nationale de la Recherche

Centre National de la Recherche Scientifique

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsanm.2c05088

Reference39 articles.

1. Infrared reflection-absorption spectroscopy of adsorbed molecules

2. Localized Surface Plasmon Resonance Biosensing: Current Challenges and Approaches

3. New materials for tunable plasmonic colloidal nanocrystals

4. Heavily-doped colloidal semiconductor and metal oxide nanocrystals: an emerging new class of plasmonic nanomaterials

5. Review of mid-infrared plasmonic materials

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