Passive and Active Oxidation of Si(100) by Atomic Oxygen: A Theoretical Study of Possible Reaction Mechanisms-Reference-Cited by-同舟云学术

Passive and Active Oxidation of Si(100) by Atomic Oxygen: A Theoretical Study of Possible Reaction Mechanisms

Published:2002-06-25 Issue:29 Volume:124 Page:8730-8740
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Choi Cheol Ho¹,Liu Da-Jiang¹,Evans J. W.¹,Gordon Mark S.¹

Affiliation:

1. Contribution from the Department of Chemistry, College of Natural Sciences, Kyungpook National University, Taegu 702-701, South Korea, and Ames Laboratory, Department of Mathematics, and Department of Chemistry, Iowa State University, Ames, Iowa 50011

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/ja012454h

Reference70 articles.

1. The interaction of molecular and atomic oxygen with Si(100) and Si(111)

2. Initial Oxidation of Si(100)-(2×1)as an Autocatalytic Reaction

3. Atomic versus molecular reactivity at the gas-solid interface: The adsorption and reaction of atomic oxygen on the Si(100) surface

4. Oxide-cluster nucleation, growth, and saturation on Si(001)-(2×1) surfaces: Atomic-scale measurements and models

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