High temperature transformation, O<sub>2</sub> etching, and passivation of single SiO<sub>x</sub> nanoparticles: kinetics and optical properties as structure probes-Reference-Cited by-同舟云学术

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High temperature transformation, O₂ etching, and passivation of single SiO_x nanoparticles: kinetics and optical properties as structure probes

Published:2023-03-02 Issue: Volume: Page:
ISSN:0026-8976
Container-title:Molecular Physics
language:en
Short-container-title:Molecular Physics

Author:

Rodriguez Daniel J.¹,Lau Chris Y.¹,Friese Abigail M.¹,Anderson Scott L.¹

Affiliation:

1. Department of Chemistry, University of Utah, Salt Lake City, UT, USA

Funder

Department of Energy

Office of Science

Basic Energy Sciences

Gas Phase Chemical Physics Program

University of Utah Eyring Chair Funds

Publisher

Informa UK Limited

Subject

Physical and Theoretical Chemistry,Condensed Matter Physics,Molecular Biology,Biophysics

Link

https://www.tandfonline.com/doi/pdf/10.1080/00268976.2023.2184652

Reference37 articles.

1. Reaction of Oxygen with Si(111) and (100): Critical Conditions for the Growth of SiO2

2. Kinetics of the adsorption of O2 and of the desorption of SiO on Si(100): A molecular beam, XPS, and ISS study

3. The reaction of atomic oxygen with Si(100) and Si(111)

4. The reaction of atomic oxygen with Si(100) and Si(111)

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