Atomic Layer Deposition of Ruthenium on Ruthenium Surfaces: A Theoretical Study
Author:
Affiliation:
1. Department of Chemistry, KU Leuven, Celestijnenlaan 200F, B-3001 Leuven, Belgium
2. imec, Kapeldreef 75, B-3001 Leuven, Belgium
3. Department of Chemistry, PASMANT research group, University of Antwerp, B-2610 Wilrijk, Antwerp, Belgium
Funder
Fonds Wetenschappelijk Onderzoek
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/jp5125958
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1. The Deposition of Ru and RuO2 Films for DRAM Electrode
2. ALD Ru and its Application in DRAM MIM-Capacitors and Interconnect
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5. Plasma-Enhanced Atomic Layer Deposition of Ru–TiN Thin Films for Copper Diffusion Barrier Metals
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