Vapor Pressure of Tetrakis(dimethylamino)germanium-Reference-Cited by-同舟云学术

Vapor Pressure of Tetrakis(dimethylamino)germanium

Published:2010-08-20 Issue:9 Volume:55 Page:4095-4097
ISSN:0021-9568
Container-title:Journal of Chemical & Engineering Data
language:en
Short-container-title:J. Chem. Eng. Data

Author:

Morávek Pavel¹,Fulem Michal¹,Růžička Květoslav¹,Pangrác Jiří¹,Hulicius Eduard¹,Šimeček Tomislav¹,Růžička Vlastimil¹,Rushworth Simon A.¹

Affiliation:

1. Department of Physical Chemistry, Institute of Chemical Technology, Prague, Technická 5, CZ-166 28 Prague 6, Czech Republic, Department of Semiconductors, Institute of Physics, Academy of Sciences of the Czech Republic, v. v. i., Cukrovarnická 10, 162 00 Prague 6, Czech Republic, and SAFC Hitech, Power Road, Bromborough, Wirral, Merseyside CH62 3QF, United Kingdom

Publisher

American Chemical Society (ACS)

Subject

General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/je100295f

Reference19 articles.

1. Organometallic vapor phase epitaxial growth studies of GaP1−xSbx and InP1−xSbx

2. Thermodynamic analysis of metalorganic vapor phase epitaxy of III–V alloy semiconductors

3. Thermodynamic analysis of GaxB1−xN grown by MOVPE

4. Vapor pressure of metal organic precursors

5. Measurement of vapour pressure of In-based metalorganics for MOVPE

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