Author:
Law Mark E.,Jones Kevin S.,Radic Ljubo,Crosby Robert,Clark Mark,Gable Kevin,Ross Carrie
Abstract
As device lots become more and more expensive, process modeling is increasingly important. Process simulation and modeling is increasingly sophisticated but the accuracy remains a problem. There is generally a time lag between the introduction of a particular process and its accurate modeling – the problem of “yesterday's technology modeled tomorrow”. For many problems, absolute accuracy isn't required. Relative trends provide excellent information about the process in question. For this reason, process simulation is still a useful technique for guiding process development.
Publisher
Springer Science and Business Media LLC
Cited by
3 articles.
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1. Device Simulation Using Silvaco ATLAS Tool;Technology Computer Aided Design;2013-05-03
2. Perspectives and challenges in nanoscale device modeling;Microelectronics Journal;2005-07
3. Upcoming Challenges for Process Modeling;Simulation of Semiconductor Processes and Devices 2007