Ion-Beam-Induced Epitaxy and Solid Phase Epitaxy of Sigec on Si Formed by Ge and C Ion Implantation and their Structural and Optical Properties

Abstract

AbstractEpitaxial layers of Si1-x-yGexCy on Si(100) (x=0.13 and y=0.014 at peak concentration) were formed by ion implantation of Ge ions and C ions at room temperature (RT) and by subsequent IBIEC (ion-beam-induced epitaxial crystallization) process with 400keV Ge and ar ions at 300-400°C and SPEG (solid phase epitaxial growth) process up to 840°C. Crystallization up to the surface both by IBIEC and SPEG processes has been confirmed with RBS-channeling analysis. X-ray diffraction experiments have demonstrated strain compensation by incorporation of C atoms for IBIEC-grown Si1-x-yGexCy/Si samples, whereas strain accommodation due to C precipitation has been observed for SPEG-grown Si1-x-yGexCy/Si samples. Photoluminescence (PL) observed at 2K from IBIEC-grown samples has shown intense I1 peak with/without I1 related (Ar) peak and that from SPEG-grown samples has shown G line emission. these optical properties could suggest that small vacancy agglomeration is dominant in IBIEC-grown samples and C agglomeration is dominant in SPEG-grown samples, respectively.