Author:
Brown J.D.,Yu Zhonghai,Matthews J.,Harney S.,Boney J.,Schetzina J.F.,Benson J.D.,Dang K.W.,Terrill C.,Nohava Thomas,Yang Wei,Krishnankutty Subash
Abstract
A visible-blind UV camera based on a 32 × 32 array of backside-illuminated GaN/AlGaN p-i-n photodiodes has been successfully demonstrated. Each of the 1024 photodiodes in the array consists of a base n-type layer of AlGaN (~20%) onto which an undoped GaN layer followed by a p-type GaN layer is deposited by metallorganic vapor phase epitaxy. Double-side polished sapphire wafers are used as transparent substrates. Standard photolithographic, etching, and metallization procedures were employed to obtain fully-processed devices. The photodiode array was hybridized to a silicon readout integrated circuit using In bump bonds. Output from the UV camera was recorded at room temperature at a frame rate of 30 Hz. This new type of visible-blind digital camera is sensitive to radiation from 320 nm to 365 nm in the UV spectral region.
Publisher
Springer Science and Business Media LLC
Subject
General Materials Science
Cited by
47 articles.
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