Gas Phase Reactions Relevant to Chemical Vapor Deposition: Numerical Modeling

Abstract

AbstractNumerical modeling of gas phase chemical kinetics was used to investigate reactions following silane decomposition to suggest experimental conditions and to interpret concentrations measurements. The effects of concentration and temperature gradients on kinetic pathways and reactive intermediates were studied. These processes are relevant to silicon-based chemical vapor deposition (CVD), to flame-driven gas phase particle nucleation, and to laser-induced processes for materials fabrication.