The adsorption of halogen molecules on Ti (110) surface
Author:
Publisher
Springer Science and Business Media LLC
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Link
https://link.springer.com/content/pdf/10.1557/s43578-021-00106-8.pdf
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4. O.E. Tereshchenko, D. Paget, K.V. Toropetsky, V.L. Alperovich, S.V. Eremeev, A.V. Bakulin, S.E. Kulkova, B.P. Doyle, S. Nannarone, Etching or stabilization of GaAs (001) under alkali and halogen adsorption. J. Phys. Chem. C 116, 8535 (2012)
5. G.N. Ankah, A. Pareek, S. Cherevko, A.A. Topalov, M. Rohwerder, F.U. Renner, The influence of halides on the initial selective dissolution of Cu3Au (111). Electrochim. Acta 85, 384 (2012)
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