Examination of the Hydrogen Incorporation into Radio Frequency-Sputtered Hydrogenated SiNx Thin Films

Abstract

In this work, amorphous hydrogen-free silicon nitride (a-SiNx) and amorphous hydrogenated silicon nitride (a-SiNx:H) films were deposited by radio frequency (RF) sputtering applying various amounts of hydrogen gas. Structural and optical properties were investigated as a function of hydrogen concentration. The refractive index of 1.96 was characteristic for hydrogen-free SiNx thin film and with increasing H2 flow it decreased to 1.89. The hydrogenation during the sputtering process affected the porosity of the thin film compared with hydrogen-free SiNx. A higher porosity is consistent with a lower refractive index. Fourier-transform infrared spectroscopy (FTIR) confirmed the presence of 4 at.% of bounded hydrogen, while elastic recoil detection analysis (ERDA) confirmed that 6 at.% hydrogen was incorporated during the growing mechanism. The molecular form of hydrogen was released at a temperature of ~65 °C from the film after annealing, while the blisters with 100 nm diameter were created on the thin film surface. The low activation energy deduced from the Arrhenius method indicated the diffusion of hydrogen molecules.