Modeling and Control of SiNx Film Growth using the Kinetic Monte Carlo Method: Impact of Gas Flow Rate on Surface Roughness and Film Thickness
Author:
Publisher
Springer Science and Business Media LLC
Subject
Electronic, Optical and Magnetic Materials
Link
https://link.springer.com/content/pdf/10.1007/s12633-023-02415-5.pdf
Reference41 articles.
1. Xiong W et al (2020) SiNx films and membranes for photonic and MEMS applications. J Mater Sci: Mater Electron 31:90–97
2. Wang X et al (2020) An InGaN/SiNx/Si uniband diode. J Electron Mater 49:3577–3582
3. Xu Q et al (2020) Stressor SiNx contact etch stop layer (CESL) technology and its application in nano-scale transistors. J Mater Sci: Mater Electron 31:10078–10083
4. Chen TC, Yu IS, Yang ZP (2020) Hydrogenation behaviors in passivated emitter and rear silicon solar cells with variously hydrogenated SiNx films. Appl Surf Sci 521:146386
5. Sahu R et al (2020) Silicon solar cells with nitrogen-rich SiNx/Si interfacial passivation by low-energy nitrogen-ion implantation. Sol Energy Mater Sol Cells 220:110858
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