Examination of Bulge Test for Determining Residual Stress, Young’s Modulus, and Poisson’s Ratio of 3C-SiC Thin Films-Reference-Cited by-同舟云学术

Examination of Bulge Test for Determining Residual Stress, Young’s Modulus, and Poisson’s Ratio of 3C-SiC Thin Films

Published:2003-04 Issue:2 Volume:16 Page:46-54
ISSN:0893-1321
Container-title:Journal of Aerospace Engineering
language:en
Short-container-title:J. Aerosp. Eng.

Author:

Mitchell Jay S.¹,Zorman Christian A.²,Kicher Thomas³,Roy Shuvo⁴,Mehregany Mehran⁵

Affiliation:

1. PhD Precandidate, Dept. of Mechanical Engineering, Univ. of Michigan, 2250 G.G. Brown, 2350 Hayward, Ann Arbor, MI 48109-2125.

2. Dept. of Electrical Engineering and Computer Science, Case Western Reserve Univ., 10900 Euclid Ave., Cleveland, OH 44106.

3. Dept. of Mechanical Engineering, Univ. of Michigan, 2250 G.G. Brown, 2350 Hayward, Ann Arbor, MI 48109-2125.

4. Dept. of Electrical Engineering and Computer Science, Case Western Reserve Univ., 10900 Euclid Ave., Cleveland OH 44106. Current address: Dept. of Biomedical Engineering, The Cleveland Clinic Foundation, Cleveland OH 44195.

5. BFGoodrich Professor of Engineering Innovation, Dept. of Electrical Engineering and Computer Science, Bingham Bldg, Room 118, Case Western Reserve Univ., 10900 Euclid Avenue, Cleveland, OH 44106 (corresponding author).

Publisher

American Society of Civil Engineers (ASCE)

Subject

Mechanical Engineering,Aerospace Engineering,General Materials Science,Civil and Structural Engineering

Link

http://ascelibrary.org/doi/pdf/10.1061/%28ASCE%290893-1321%282003%2916%3A2%2846%29

Reference24 articles.

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3. Berg J. von Reichert W. Obermeier E. Wagner C. Krotz Diamler G. and Niemann E. (1996). “Dependence of the elastic properties of thin β-SiC films on their crystallinity and the deposition conditions.” Transactions of the 3rd Int. HiTEC Alburquerque N.M. 51–57.

4. Error limitations in the determination of mechanical properties of thin films.;Breton F. A.;J. Reinf. Plast. Compos.,1997

5. Fracture strength and biaxial modulus measurement of plasma silicon nitride films

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