Effects of RF Magnetron Sputtering Power on the Mechanical Behavior of Zr-Cu-Based Metallic Glass Thin Films

Author:

Nguyen Tra Anh Khoa1,Dang Nhat Minh1ORCID,Lin Chi-Hang12,Lee Meng-Chieh3,Wang Zhao-Ying1,Tsai Yao-Chuan4ORCID,Lin Ming-Tzer15ORCID

Affiliation:

1. Graduate Institute of Precision Engineering, National Chung Hsing University, Taichung 402, Taiwan

2. Aeronautical Systems Research Division, National Chung-Shan Institute of Science and Technology, Taichung 407, Taiwan

3. ASML Technology Taiwan Ltd., Hsinchu City 300, Taiwan

4. Department of Bio-Industrial Mechatronics Engineering, National Chung Hsing University, Taichung City 402, Taiwan

5. Industrial and Smart Technology Program, Academy of Circular Economy, National Chung Hsing University, Nantou 540, Taiwan

Abstract

Zirconium-based metallic glass films are promising materials for nanoelectronic and biomedical applications, but their mechanical behavior under different conditions is not well understood. This study investigates the effects of radio frequency (RF) power and test temperature on the nanostructure, morphology, and creep behavior of Zr55Cu30Al10Ni5 metallic glass films prepared by RF magnetron sputtering. The films were characterized by X-ray diffraction and microscopy, and their mechanical properties were measured by a bulge test system. The results show that the films were amorphous and exhibited a transition from noncolumnar to columnar morphology as the RF power increased from 75 W to 125 W. The columnar morphology reduced the creep resistance, Young’s modulus, residual stress, and hardness of the films. The creep behavior of the films was also influenced by the test temperature, with higher temperature leading to higher creep strain and lower creep stress. The findings of this study provide insights into the optimization of the sputtering parameters and the design of zirconium-based metallic glass films for various applications.

Publisher

MDPI AG

Subject

General Materials Science,General Chemical Engineering

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