Zur Bestimmung von Oxidschichtdicken aus ESCA-Messungen-Reference-Cited by-同舟云学术

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Zur Bestimmung von Oxidschichtdicken aus ESCA-Messungen

Published:1975 Issue:4 Volume:10 Page:K35-K37
ISSN:0023-4753
Container-title:Kristall und Technik
language:de
Short-container-title:Krist. Techn.

Author:

Leonhardt G.,Bilz H.-J.

Publisher

Wiley

Subject

Condensed Matter Physics,General Materials Science,General Chemistry,Pharmacology (medical),Complementary and alternative medicine,Pharmaceutical Science

Reference6 articles.

1. , , : wird veröffentlicht

2. Ellipsometry in the sub-monolayer region

3. , , , , : Uppsala University Institute of Physics 830, August 1973

4. ESCA studies of some AIIIBv compounds with Ga and As

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1. Evaluation of electron inelastic mean free paths for selected elements and compounds;Surface and Interface Analysis;2000-02

2. Electron spectroscopic analysis of the SiO2/Si system and correlation with metal–oxide–semiconductor device characteristics;Journal of Applied Physics;1996-05-01

3. An Electron Spectroscopic Investigation of Attenuation Lengths of Electrons in SiO2 in the Energy Range 450 eV ≤Ekin ≤ 3100 eV;Surface and Interface Analysis;1992-12

4. Calculations of electron inelastic mean free paths. III. Data for 15 inorganic compounds over the 50-2000 eV range;Surface and Interface Analysis;1991-12

5. X-Ray Photoelectron Spectroscopy Analysis of Silicon Oxide Deposited by a Nitrous Oxide/Silane Glow Discharge;MRS Proceedings;1984

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