An Electron Spectroscopic Investigation of Attenuation Lengths of Electrons in SiO2 in the Energy Range 450 eV ≤Ekin ≤ 3100 eV
Author:
Publisher
Wiley
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference21 articles.
1. Calculations of electorn inelastic mean free paths. II. Data for 27 elements over the 50-2000 eV range
2. Calculations of electron inelastic mean free paths. III. Data for 15 inorganic compounds over the 50-2000 eV range
3. Calculation of escape depths from inelastic mean free paths
4. Properties of oxidized silicon as determined by angular-dependent X-ray photoelectron spectroscopy
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Role of O2 and N2 addition on low-reflectance Si surface formation using moderate-pressure (3.3 kPa) hydrogen plasma;Physica Scripta;2023-10-13
2. Uncertainty Evaluation in Measurement of Thickness of SiO2/Si Using X-Ray Photoelectron Spectroscopy;Advanced Materials Research;2014-04
3. Titanium–silicon oxide film structures for polarization-modulated infrared reflection absorption spectroscopy;Thin Solid Films;2009-01
4. Multiple sample manipulator with five degrees of freedom for angle-resolved spectroscopy in ultrahigh vacuum;Review of Scientific Instruments;2003-02
5. Ultrathin SiO2 on Si II. Issues in quantification of the oxide thickness;Surface and Interface Analysis;2002
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3