Bottom‐Up Growth of n‐Type Polymer Monolayers for High‐Performance Complementary Integrated Circuits

Author:

Guo Yifu12,Yang Mingqun3,Deng Junyang1,Ding Chenming1,Duan Chunhui3ORCID,Li Mengmeng12ORCID,Li Ling1,Liu Ming1

Affiliation:

1. Key Laboratory of Microelectronic Devices and Integrated Technology Institute of Microelectronics Chinese Academy of Sciences Beijing 100029 China

2. University of Chinese Academy of Sciences Beijing 100049 China

3. Institute of Polymer Optoelectronic Materials & Devices State Key Laboratory of Luminescent Materials and Devices South China University of Technology Guangzhou 510640 China

Abstract

AbstractDownscaling the semiconductor into ultrathin film is of vital importance to high‐performance field–effect transistors (FETs), but the high‐mobility FETs based on conjugated polymer monolayers have been rarely realized. Especially, the lack of high‐performance n‐type polymer monolayer FETs hinders the development of complementary integrated circuits. Herein, by fine‐tuning the supramolecular assembly of two thiazole flanked naphthalene diimide‐based conjugated polymers, the ≈2.5 nm‐thick monolayers with well‐defined fibrillar morphology are grown in a controllable way, where the one‐dimensional solution‐state structures are inherited. The resultant monolayer FETs show the electron mobility up to 0.25 cm2 V−1 s−1, among the record for n‐type polymer monolayer FETs. More importantly, the first demonstration of polymer monolayer complementary integrated circuits is present, and a record‐high inverter gain of 113 is achieved, which is also identical to the best polymer thin‐film inverters.

Funder

National Natural Science Foundation of China

Publisher

Wiley

Subject

Electronic, Optical and Magnetic Materials

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