Inductively Coupled Plasma Source Using Internal Multiple U-Type Antenna for Ultra Large-Area Plasma Processing
Author:
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Reference18 articles.
1. Design of a magnetic-pole enhanced inductively coupled plasma source
2. Inductively Coupled Plasma Source with Internal Straight Antenna
3. A traveling wave-driven, inductively coupled large area plasma source
4. Reactive Ion Beam Etching Using a Broad Beam ECR Ion Source
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3. Ion energy distributions in a pulsed dual frequency inductively coupled discharge of Ar/CF4 and effect of duty ratio;Physics of Plasmas;2015-08
4. Linear Plasma Sources for Large Area Film Deposition: A Brief Review;Plasma Science and Technology;2014-04
5. Temporal evolution of plasma potential in a large-area pulsed dual-frequency inductively coupled discharge;Journal of Physics D: Applied Physics;2013-05-24
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