Linear Plasma Sources for Large Area Film Deposition: A Brief Review
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://stacks.iop.org/1009-0630/16/i=4/a=10/pdf
Reference72 articles.
1. Novel high-density plasma tool for large area flat panel display etching
2. 42.3: Development of a New HDP Source for LCD Etching Process
3. Glow discharge processing in the liquid crystal display industry
4. Coal pyrolysis to acetylene using dc hydrogen plasma torch: effects of system variables on acetylene concentration
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Kinetic simulations of capacitively coupled plasmas driven by tailored voltage waveforms with multi-frequency matching;Plasma Sources Science and Technology;2024-07-01
2. Overall aspect for designing magnetron sputtering plasma sources and their applications in the deposition of ITO films;AIP Advances;2024-05-01
3. Effect of magnetic field due to permanent magnets on microwave discharge plasma;Indian Journal of Physics;2023-12-24
4. An investigation on improving the homogeneity of plasma generated by linear microwave plasma source with a length of 1550 mm;Plasma Science and Technology;2021-01-15
5. A 3D numerical analysis on magnetic field enhanced microwave linear plasma;AIP Advances;2020-01-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3