Analysis of the Transport of Ionized Titanium Atoms in a Highly Ionized Sputter Deposition Process-Reference-Cited by-同舟云学术

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Analysis of the Transport of Ionized Titanium Atoms in a Highly Ionized Sputter Deposition Process

Published:2007-04 Issue:S1 Volume:4 Page:S424-S429
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process. Polym.

Author:

de Poucques Ludovic,Imbert Jean-Christophe,Boisse-Laporte Caroline,Bretagne Jean,Ganciu Mihaï,Teulé-Gay Lionel,Vasina Petr,Touzeau Michel

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Reference14 articles.

1. Metal ion deposition from ionized mangetron sputtering discharge

2. Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization

3. Antenna sputtering in an internal inductively coupled plasma for ionized physical vapor deposition

4. A novel pulsed magnetron sputter technique utilizing very high target power densities

5. Target material pathways model for high power pulsed magnetron sputtering

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2. On density distribution of Ti atom and ion ground states near the target in HiPIMS discharge using cavity ring-down spectroscopy and laser induced fluorescence;Plasma Sources Science and Technology;2022-05-01

3. Temporal studies of titanium ionised density fraction in reactive HiPIMS with nitrogen admixture;Plasma Sources Science and Technology;2021-12-01

4. Microstructure of titanium coatings controlled by pulse sequence in multipulse HiPIMS;Surface and Coatings Technology;2021-10

5. Revisiting particle dynamics in HiPIMS discharges. II. Plasma pulse effects;Journal of Applied Physics;2020-07-28

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