Author:
Souček Pavel,Hnilica Jaroslav,Klein Peter,Fekete Matej,Vašina Petr
Funder
Ministerstvo Školství, Mládeže a Tělovýchovy
Grantová Agentura České Republiky
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference67 articles.
1. High-current low-pressure quasi-stationary discharge in a magnetic field: experimental research;Mozgrin;Plasma Phys. Rep.,1995
2. A novel pulsed magnetron sputter technique utilizing very high target power densities;Kouznetsov;Surf. Coat. Technol.,1999
3. D. Lundin, M. Tiberiu, J. T. Gudmundsson (Eds.), High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications, 1st ed., Elsevier, Amsterdam, 2019.
4. J. Gudmundsson, Physics and technology of magnetron sputtering discharges, Plasma Sources Sci. T. 29 (2020) 113001. doi:https://doi.org/10.1088/1361-6595/abb7bd.
5. Ionized physical vapor deposition (IPVD): a review of technology and applications;Helmersson;Thin Solid Films,2006
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