Revisiting particle dynamics in HiPIMS discharges. II. Plasma pulse effects-Reference-Cited by-同舟云学术

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Revisiting particle dynamics in HiPIMS discharges. II. Plasma pulse effects

Published:2020-07-28 Issue:4 Volume:128 Page:043304
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Hnilica Jaroslav¹^ORCID,Klein Peter¹^ORCID,Vašina Petr¹,Snyders Rony²³,Britun Nikolay²^ORCID

Affiliation:

1. Department of Physical Electronics, Masaryk University, Kotlářská 2, CZ-61137 Brno, Czech Republic

2. Chimie des Interactions Plasma-Surface (ChIPS), CIRMAP, Université de Mons, 23 Place du Parc, B-7000 Mons, Belgium

3. Materia Nova Research Center, Parc Initialis, B-7000 Mons, Belgium

Funder

Ministry of Education, Youth and Sports of Czech Republic

Czech Science Foundation

GreenWin

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/5.0009380

Reference59 articles.

1. Ionized physical vapor deposition (IPVD): A review of technology and applications

2. A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

3. High power pulsed magnetron sputtered CrN films

4. On the film density using high power impulse magnetron sputtering

5. An introduction to thin film processing using high-power impulse magnetron sputtering

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Plasma dynamics of individual HiPIMS pulses: imaging study using high-frame-rate camera;Plasma Sources Science and Technology;2024-05-01

2. Analysis of a second peak of electron density observed in high-power impulse magnetron sputtering plasma using a Langmuir probe;Japanese Journal of Applied Physics;2024-01-01

3. High-Power Impulse Magnetron Sputter-Deposited Chromium-Based Coatings for Corrosion Protection;Coatings;2023-12-18

4. Azimuthal ion movement in HiPIMS plasmas—Part II: lateral growth fluxes;Plasma Sources Science and Technology;2023-10-01

5. Azimuthal ion movement in HiPIMS plasmas—part I: velocity distribution function;Plasma Sources Science and Technology;2023-10-01

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