Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization-Reference-Cited by-同舟云学术

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Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization

Published:1999-07-30 Issue:Part 1, No. 7B Volume:38 Page:4291-4295
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Yamashita Masahiro,Setsuhara Yuichi,Miyake Shoji,Kumagai Masao,Shoji Tatsuo,Musil Jindrich

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

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