Using ammonia for reactive magnetron sputtering, a possible alternative to HiPIMS?-Reference-Cited by-同舟云学术

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Using ammonia for reactive magnetron sputtering, a possible alternative to HiPIMS?

Published:2020-02 Issue: Volume:502 Page:144176
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Rassinfosse Louis,Colaux Julien L.,Pilloud David,Nominé Alexandre,Tumanov Nikolay,Lucas Stéphane,Pireaux Jean-Jacques,Haye Emile

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference60 articles.

1. Study of the structural changes induced by air oxidation in Ti–Si–N hard coatings;Pilloud;Surf. Coat. Technol.,2008

2. Structure and tribological properties of reactively sputtered Zr–Si–N films;Pilloud;Thin Solid Films,2006

3. Modern coatings in high performance cutting applications;Kalss;Int. J. Refract Metal Hard Mater.,2006

4. Mechanical properties optimization of tungsten nitride thin films grown by reactive sputtering and laser ablation;Samano;Vacuum,2010

5. Infrared plasmonics with conductive ternary nitrides;Metaxa;ACS Appl. Mater. Interfaces,2017

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1. Comparison of aluminum nitride thin films prepared by magnetron sputter epitaxy in nitrogen and ammonia atmosphere;Applied Physics Letters;2024-04-29

2. When magnetron sputtering deposition meets machine learning: Application to process anomaly detection;Surface and Coatings Technology;2024-02

3. Challenges and coating solutions for wear and corrosion inside Lead Bismuth Eutectic: A review;Surface and Coatings Technology;2022-07

4. Enhancing Cycling Stability and Specific Capacitance of Vanadium Nitride Electrodes by Tuning Electrolyte Composition;Journal of The Electrochemical Society;2022-06-01

5. Influence of oxygen co-implantation on germanium out-diffusion and nanoclustering in SiO2/Si films;Thin Solid Films;2022-03

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