EFFECT OF ARGON WORKING GAS PRESSURE ON MECHANICAL STRESSES IN Mo/Si MULTILAYER X-RAY MIRRORS

Abstract

By the method of X-ray tensometry (=0.154 nm), the dependences of residual stresses in Mo/Si multilayer Xray mirrors (MXMs) obtained by direct-current magnetron sputtering were studied as a function of the sputtering Ar pressure in the range of 1…4 mTorr. It is shown that an increase in pressure is accompanied by an increase in stresses from ~ 0.4 to ~ 0.8 GPa for a group of mirrors with periods near 7 nm and from ~ 0.9 to ~ 1.6 GPa for a group of mirrors with periods near 14 nm. The angles of texture misorientation for Mo crystallites were measured as a function of argon pressure. Mechanisms have been proposed to explain the reasons for the increase in stresses.