MOCVD of TiO2Thin Films using a Heteroleptic Titanium Complex: Precursor Evaluation and Investigation of Optical, Photoelectrochemical and Electrical Properties-Reference-Cited by-同舟云学术

MOCVD of TiO2Thin Films using a Heteroleptic Titanium Complex: Precursor Evaluation and Investigation of Optical, Photoelectrochemical and Electrical Properties

Published:2014-07-25 Issue:7-8-9 Volume:20 Page:224-233
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Banerjee Manish¹,Dang Van-Son¹,Bledowski Michal¹,Beranek Radim¹,Becker Hans-Werner²,Rogalla Detlef²,Edengeiser Eugen³,Havenith Martina³,Wieck Andreas D.⁴⁵,Devi Anjana¹⁵

Affiliation:

1. Inorganic Chemistry II, Faculty of Chemistry and Biochemistry; Ruhr-University; Bochum 44801 Bochum (Germany)

2. Central Unit for Ion Beams and Radionuclides (RUBION); Ruhr-University; Bochum 44801 Bochum (Germany)

3. Physical Chemistry II; Ruhr-University; Bochum 44801 Bochum (Germany)

4. Applied Solid State Physics; Ruhr-University; Bochum 44801 Bochum (Germany)

5. Materials Research Department; Ruhr-University; Bochum 44801 Bochum (Germany)

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/cvde.201407125/fullpdf