An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
Author:
Affiliation:
1. Inorganic Materials Chemistry
2. Ruhr-University Bochum
3. 44780 Bochum
4. Germany
5. Institute of Electrical Engineering and Plasma Technology
6. Macromolecular and Technical Chemistry
7. University of Paderborn
8. 33098 Paderborn
Abstract
A new Ti-precursor for low-temperature PE-ALD of titanium dioxide thin films as gas barrier layers on polymer substrates.
Funder
Deutsche Forschungsgemeinschaft
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2016/TC/C5TC03385C
Reference53 articles.
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4. Titanium Dioxide Nanomaterials for Photovoltaic Applications
5. Atomic layer deposition of Al2O3 and Al2O3/TiO2 barrier coatings to reduce the water vapour permeability of polyetheretherketone
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