Reactivity of Silicon Surfaces in the Presence of Adsorbed Hydrogen and Chlorine
Author:
Publisher
Wiley
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/cvde.201006870/fullpdf
Reference29 articles.
1. Materials computation towards technological impact: The multiscale approach to thin films deposition
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5. Multi-scale modeling of chemical vapor deposition processes for thin film technology
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