The Direct Patterning of Nanoporous Interlayer Dielectric Insulator Films by Nanoimprint Lithography-Reference-Cited by-同舟云学术

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The Direct Patterning of Nanoporous Interlayer Dielectric Insulator Films by Nanoimprint Lithography

Published:2007-10-05 Issue:19 Volume:19 Page:2919-2924
ISSN:0935-9648
Container-title:Advanced Materials
language:en
Short-container-title:Adv. Mater.

Author:

Ro H. W.,Jones R. L.,Peng H.,Hines D. R.,Lee H.-J.,Lin E. K.,Karim A.,Yoon D. Y.,Gidley D. W.,Soles C. L.

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Reference26 articles.

1. Imprint of sub‐25 nm vias and trenches in polymers

2. Imprint Lithography with 25-Nanometer Resolution

3. Recent progress in nanoimprint technology and its applications

4. Imprint lithography with sub-10 nm feature size and high throughput

5. Fabrication of 5nm linewidth and 14nm pitch features by nanoimprint lithography

Cited by 27 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Direct nanoimprinting of nanoporous organosilica films consisting of covalently crosslinked photofunctional frameworks;Nanoscale;2020

2. Hierarchically Patterned Elastomeric and Thermoplastic Polymer Films through Nanoimprinting and Ultraviolet Light Exposure;ACS Omega;2018-11-13

3. Solution-processed ultra-low-k thin films comprising single-walled aluminosilicate nanotubes;Nanoscale;2016

4. Nanomembrane Materials Based on Polymer Blends;Design and Applications of Nanostructured Polymer Blends and Nanocomposite Systems;2016

5. Room temperature direct imprinting of porous glass prepared from phase-separated glass;Nanotechnology;2015-06-05

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