Direct nanoimprinting of nanoporous organosilica films consisting of covalently crosslinked photofunctional frameworks-Reference-Cited by-同舟云学术

Direct nanoimprinting of nanoporous organosilica films consisting of covalently crosslinked photofunctional frameworks

Published:2020 Issue:41 Volume:12 Page:21146-21154
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Mizoshita Norihiro¹²³⁴^ORCID,Yamada Yuri¹²³⁴^ORCID,Murase Masakazu¹²³⁴,Goto Yasutomo¹²³⁴,Inagaki Shinji¹²³⁴^ORCID

Affiliation:

1. Toyota Central R&D Laboratories

2. Inc.

3. Nagakute

4. Japan

Abstract

Nanoimprinting of organosilica materials is a new powerful tool for preparing nanostructured robust films that are suitable for photofunctional applications.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2020/NR/D0NR03272G

Reference42 articles.

1. Nanoimprint Lithography: Methods and Material Requirements

2. Nanoimprint lithography steppers for volume fabrication of leading-edge semiconductor integrated circuits

3. A review of roll-to-roll nanoimprint lithography

4. Imprint of sub‐25 nm vias and trenches in polymers

5. Ultrafast and direct imprint of nanostructures in silicon

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