Analysis of the Annealing Budget of Metal Oxide Thin‐Film Transistors Prepared by an Aqueous Blade‐Coating Process-Reference-Cited by-同舟云学术

Analysis of the Annealing Budget of Metal Oxide Thin‐Film Transistors Prepared by an Aqueous Blade‐Coating Process

Published:2022-12-12 Issue:8 Volume:33 Page:2207966
ISSN:1616-301X
Container-title:Advanced Functional Materials
language:en
Short-container-title:Adv Funct Materials

Author:

Tang Tianyu¹,Dacha Preetam¹,Haase Katherina¹,Kreß Joshua¹²,Hänisch Christian²,Perez Jonathan³,Krupskaya Yulia³,Tahn Alexander⁴,Pohl Darius⁴,Schneider Sebastian⁴,Talnack Felix¹,Hambsch Mike¹,Reineke Sebastian²,Vaynzof Yana¹²,Mannsfeld Stefan C. B.¹^ORCID

Affiliation:

1. Center for Advancing Electronics Dresden (CFAED) Technische Universität Dresden 01069 Dresden Germany

2. Dresden Integrated Center for Applied Physics and Photonic Materials (IAPP) Institute for Applied Physics Technische Universität Dresden 01069 Dresden Germany

3. Leibniz Institute for Solid State and Materials Research (IFW) 01069 Dresden Germany

4. Dresden Center for Nanoanalysis (DCN) Center for Advancing Electronics Dresden (CFAED) Technische Universität Dresden 01069 Dresden Germany

Funder

China Scholarship Council

European Social Fund

Deutsche Forschungsgemeinschaft

European Research Council

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

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