A comparative study of the microstructure-dielectric properties of crystalline SrTiO3 ALD films obtained via seed layer approach-Reference-Cited by-同舟云学术

A comparative study of the microstructure-dielectric properties of crystalline SrTiO3 ALD films obtained via seed layer approach

Published:2011-03-29 Issue:8 Volume:208 Page:1920-1924
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Popovici Mihaela,Tomida Kazuyuki,Swerts Johan,Favia Paola,Delabie Annelies,Bender Hugo,Adelmann Christoph,Tielens Hilde,Brijs Bert,Kaczer Ben,Pawlak Malgorzata A.,Kim Min-Soo,Altimime Laith,Van Elshocht Sven,Kittl Jorge A.

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/pssa.201026710/fullpdf

Reference17 articles.

1. Capacitors with an Equivalent Oxide Thickness of <0.5 nm for Nanoscale Electronic Semiconductor Memory

2. Improved Capacitance Density and Reliability of High-$ \kappa$$\hbox{Ni}/\hbox{ZrO}_{2}/\hbox{TiN}$ MIM Capacitors Using Laser-Annealing Technique

3. The role of the HfO2–TiN interface in capacitance–voltage nonlinearity of Metal-Insulator-Metal capacitors

4. NiCr Bottom Electrodes for Ta 2 O 5 High Dielectric Thin Films in Metal-Insulator-Metal Capacitors

5. Controlled growth of rutile TiO2 by atomic layer deposition on oxidized ruthenium

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